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Time-Resolved Surface Infrared Spectroscopy During Atomic Layer Deposition
Volume 67, Number 9 (Sept. 2013) Page 1003-1012
BRENT A. SPERLING,* JOHN HOANG, WILLIAM A. KIMES, and JAMES E. MASLAR
This work presents a novel method for obtaining surface infrared spectra with sub-second time resolution during atomic layer deposition (ALD). Using a rapid-scan Fourier transform infrared (FT-IR) spectrometer, we obtain a series of synchronized interferograms (120 ms) during multiple ALD cycles to observe the dynamics of an average ALD cycle. We use a buried metal layer (BML) substrate to enhance absorption by the surface species. The surface selection rules of the BML allow us to determine the contribution from the substrate surface as opposed to that from gas-phase molecules and species adsorbed at the windows. In addition, we use simulation to examine the origins of increased reflectivity associated with phonon absorption by the oxide layers. The simulations are also used to determine the decay in enhancement by the buried metal layer substrate as the oxide layer grows during the experiment. These calculations are used to estimate the optimal number of ALD cycles for our experimental method.
Index Headings: Atomic layer deposition; ALD; Reflection–absorption infrared spectroscopy; RAIRS; Infrared reflection–absorption spectroscopy; IRAS; Buried metal layer substrate.