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Modification of a Plasma-Therm Inductively Coupled Plasma Supply to Enable Radio-frequency Power Modulation

Volume 37, Number 6 (Dec. 1983) Page 571-573

Ensman, R.E.; Carr, J.W.; Hieftje, G.M.

A simple modification is described to enable amplitude modulation of the output of a commercial 5.0 kW inductively coupled plasma (ICP) power supply. Power modulation of an ICP might be useful in a number of practical and research situations. For example, amplitude modulation could be employed in a manner similar to optical chopping to improve signal detection efficiency in practical elemental analysis. Similarly, amplitude modulation permits the time-dependent energy flow in the plasma to be monitored.