holder

The following is an abstract for the selected article. A PDF download of the full text of this article is available here. Members may download full texts at no charge. Non-members may be charged a small fee for certain articles.


Sputtering Studies Using the Matrix Isolation Technique

Volume 28, Number 1 (Feb. 1974) Page 34-38

Green, David W.; Gruen, Dieter M.; Schreiner, Felix; Lerner, Jerome L.


The application of the matrix isolation technique to the study of the sputtering process is reported. Equations are derived which relate the experimentally measured absorbance data to the sputtering yield. These equations are applied to data from the sputtering of Nb metal by 50 keV rare gas ions. Relative sputtering yields obtained in this manner are in good agreement with sputtering yields obtained by weight loss measurements. The potential of the technique for studies of both physical and chemical sputtering and for the determination of oscillator strengths is discussed.