The following is an abstract for the selected article. A PDF download of the full text of this article is available here. Members may download full texts at no charge. Non-members may be charged a small fee for certain articles.
The Determination of HF, HCI, SiF4, and HCF3 in WF6 Gas
Volume 28, Number 2 (April 1974) Page 139-142
Chaney, C.L.; Chin, J.
An infrared absorption method in the 1- to 15-μ range has been developed for determining HF, HCl, HCF3, and SiF4 in WF6 gas. Because of the reactivity and corrosiveness of WF6, a special gas absorption cell and gas-sampling apparatus were designed and built. Calibration curves were generated for a 10-cm cell. Sensitivity values were 100 wppm for HF and HCl, and 10 wppm for HCF3 and SiF4.