The following is an abstract for the selected article. A PDF download of the full text of this article is available here. Members may download full texts at no charge. Non-members may be charged a small fee for certain articles.
Modifications to a Commercial Infrared Emission Apparatus to Permit Quantitative Applications
Volume 46, Number 1 (Jan. 1992) Page 178-180
McGuire, J.A.; Wangmaneerat, B.; Niemczyk, T.M.; Haaland, D.M.
Infrared (IR) emission spectroscopy is an ideal candidate for in situ process monitoring. Infrared spectra contain a wealth of information, and measurement of an IR emission spectrum requires only that a sufficient temperature difference exist between the radiating sample and the detector. A probe beam, such as required for absorbance or reflectance measurements, is not needed, and the sample need not be transparent. The lack of constraints on sample type and relatively simple instrumentation required to make infrared emission measurements are the major reasons that infrared emission spectroscopy has potential as a process-monitoring technique.