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Cathodic Sputtering under High-Gas-Flow Jets

Volume 49, Number 7 (July 1995) Page 880-884

Zhu, Zhubiao; Piepmeier, Edward H.

Studies of cathodic sputtering with gas flow rates up to 2.13 L/min/jet were carried out in an Atomsource sputtering atomizer with Ar as the jet gas and Cu as the cathode sample. These flow rates are 20-fold greater than those normally used and were found to increase net sputtering yield significantly. A fourfold increase in net sputtering yield was observed when the number of jets in use was decreased from six to one, with the gas flow rate and other conditions held constant. Possible explanations for these effects are offered.